Advanced Photon Source

Polishing, Dearation and Makeup
of Deinoized Process Water for APS
Presentation by R. Dortwegt on June 27, 2000

Purpose of Systems
Makeup System
Process Water (PW) Polishing system
Dearation System
Dearator Pressure Summary
Issues Well Understood
Issues To Be Considered

Purpose of Systems

Maintain quality of non-conductive water >4-5 Mohm-cm
Maintain dissolved oxygen (DO) content <10 ppb
Maintain parent metal integrity of APS technical components near that of original
Maintain a supply of makeup water
Deliver makeup water to the Process Water (PW) System upon demand
Provide for ultrafine filtration of primary water

Block Diagram of Process Water System
Block Diagram of Treatment System

Makeup System

Source used is domestic laboratory water (from Lake Michigan)
Reverse osmosis (RO) system (rental agreement) installed in July, 1999
Production rate is approximately 2500 gal/day
Normal demand is between 50-1000 gal/day
5000 gallon storage tank
RO system starts when tank level is low
Pretreatment process includes:

Softening
Activated carbon filtration
Cation polishing

RO membrane produces nominal 100.000 ohm water
Resin polishing provided to bring makeup to 18 M-ohm
Resins also used to maintain quality of storage tank (>2 M-ohm) due to ingress of DO
Pump delivers makeup water from tank when PW system pressure reaches low setpoint
Makeup water is treated in polishing or dearation loops before introduction to PW system

Process Water (PW) Polishing system

Total flow of 150 gpm
Two paralled streams of 75 gpm limited by contact time required for DO scavenging
Each stream provided with

30 cu. ft oxygen scavenger resin tank
30 cu. ft mixed bed resin tank

One stream (only) has additional 30 cu. ft mixed bed resin tank (in series)
Total 90 cu. ft mixed bed resin on line, but net effect is same as 60 cu. ft.
Original APS resins still in use

Reprocessed in 1999 after storage for 2 years
Analysis indicated less than perfect condition but still useable
Added 30 cu. ft. new resin

Filtration (2 micron absolute)
UV treatment for microbes (seems to be enough)
PW bulk is running around 10 Mohm-cm compared to 5-7 Mohm-cm originally
Regeneration processing done offsite in Delaware by licensed recovery operator
Diagram
UV treatment for microbes (seems to be enough)

P-W Polishing System

Dearation System

Design flow 450 gpm

3 pumps at 225 each (upgraded from 2 pumps at 150 each)
can run 3 pumps at 185 gpm each (total 560 gpm)

Dearator vessel 4 ft diameter x ~30 ft tall

Spray nozzle at top of vessel
Tower packing material in vessel midsection (140 cu. ft or around 12 ft. vertically)
Liquid gathered in bottom of vessel below packing
Operating pressure ~22-24 absolute
Diagram

Operating principle (droplet diagram)

Filtration: 2 micron absolute (90% of 0.5 microns removed)
Prefilter: 0.5 micron absolute

Vacuum system:

~250 cfm (net) liquid ring vacuum pumps - water sealed - 2 x 50% units
"Roots" type blower provided to augment flowrate below 100 torr
Ejectors mandatroy when blower not in operation (prevents cavitation in pump)
Diagram

Performance:

Steady state DO in dearator effluent of 3-5 ppb (>60 originally)
Recovery from 50 ppb upset in ~12 hours

Dearator Operation
Vapor Space
Dearator Vacuum System

Dearator Pressure Summary

	65 ppb in effluent	15 ppb in effluent	Current <5 ppb (in effluent)
Partial pressure of water (75F) in vapor space (torr)	22.2	22.2
Partial pressure of oxygen in vapor space (torr)	1.3	0.3
Partial pressure of nitrogen in vapor space (torr)	9.5	2.2
Total pressure in vapor space (torr)	33	24.7
Observed	30-35	23-24	21-23